Thin films facility in Ohio

Cabot Supermetals, a business unit of Cabot Corporation, will build a new 90,000 sq. ft facility for manufacturing tantalum sputtering targets and high performance materials for use in semiconductor, optics, magnetics and flat panel display thin film applications. Scheduled to be operational by early 2004, the facility will be located east of Columbus, OH, in Etna Corporate Park. The facility, which will cost USD 12 million, will position Cabot as the only manufacturer of tantalum that is vertically integrated from raw material to the finished sputtering target. Ohio-based Southgate Corporation is the project developer.

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