Plans for the 2003 CHEM show are taking shape with the announcement that sessions are being developed around four major tracks: Powder Processing, Process Controls and Automation, Maintenance and Process Integration. Top industry experts are working together to create a comprehensive User Symposium. The practical sessions will address a variety of topics ranging from business solutions to engineering-oriented user seminars. The User
Symposium is being developed by Chemical Engineering magazine in conjunction with. Chemical Week Associates Conference Group. Various associations will also be contributing to the programme. The four topic areas correspond to the three special pavilions being
featured on the show floor and the type of products being showcased at the New Product / Technology Theatre. The three special pavilions that serve as “shows within a show” are the Powder Processing Showcase, Process Control & Automation Center, and the Maintenance Showcase.
The CHEM show will take place on 18–20 November 2003 at the Jacob Javits Convention Center, New York City.
